Substrate cleaning machine "VSC727" supports pattern shapes with a special brush.
Effective for removing particles between fine pattern patterns! Easy to attach and detach the brush unit!
The substrate and film brush cleaning machine "VSC-727" can flexibly adapt to the shapes between patterns thanks to its special brushes. Unlike adhesive rollers, it is effective in removing particles between fine patterns. It employs a suction conveyor to stably transport thin substrates. 【Features】 - The brush unit can be easily detached and attached without tools. - Equipped with a gap adjuster, it accommodates substrates ranging from 60μ to 3.2mm. For more details, please contact us or download the catalog.
- Company：サーマプレシジョン
- Price：Other
